Controlled gradual and local thinning of free-standing nanometer thick Si3N4 films using reactive ion etch


Guzel F., Pitchford W. H., Kaur J.

Microsystem Technologies, vol.26, no.4, pp.1167-1172, 2020 (SCI-Expanded) identifier

  • Publication Type: Article / Article
  • Volume: 26 Issue: 4
  • Publication Date: 2020
  • Doi Number: 10.1007/s00542-019-04645-3
  • Journal Name: Microsystem Technologies
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus, Academic Search Premier, PASCAL, Applied Science & Technology Source, Compendex, Computer & Applied Sciences, INSPEC
  • Page Numbers: pp.1167-1172
  • Ankara Yıldırım Beyazıt University Affiliated: Yes