Controlled gradual and local thinning of free-standing nanometer thick Si3N4 films using reactive ion etch


Guzel F. , Pitchford W. H. , Kaur J.

Microsystem Technologies, vol.26, no.4, pp.1167-1172, 2020 (Journal Indexed in SCI Expanded) identifier

  • Publication Type: Article / Article
  • Volume: 26 Issue: 4
  • Publication Date: 2020
  • Doi Number: 10.1007/s00542-019-04645-3
  • Title of Journal : Microsystem Technologies
  • Page Numbers: pp.1167-1172