Controlled gradual and local thinning of free-standing nanometer thick Si3N4 films using reactive ion etch

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Guzel F. , Pitchford W. H. , Kaur J.

Microsystem Technologies, vol.26, no.4, pp.1167-1172, 2020 (Journal Indexed in SCI Expanded)

• Publication Type: Article / Article
• Volume: 26 Issue: 4
• Publication Date: 2020
• Doi Number: 10.1007/s00542-019-04645-3
• Title of Journal : Microsystem Technologies
• Page Numbers: pp.1167-1172