Influence of oxygen flow rate in CuO


Serin T., Gurakar S., Ot H., YILDIZ A. , SERİN N.

APPLIED SURFACE SCIENCE, vol.352, pp.155-157, 2015 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 352
  • Publication Date: 2015
  • Doi Number: 10.1016/j.apsusc.2015.01.095
  • Title of Journal : APPLIED SURFACE SCIENCE
  • Page Numbers: pp.155-157

Abstract

The structural, optical and electrical properties of cupric oxide (CuO) films coated by DC magnetron sputtering method under different oxygen flow rate (0%, 35%, 70%) were examined. The electrical transport mechanism of the films was also investigated in a temperature range of 110-400 K. Electrical conductivity of the films mainly affected by oxygen flow rate since density of states (DOS) was critically dependent on the oxygen flow rate. Considering oxygen flow rate, a direct link between the DOS and electrical properties of the films was established. (C) 2015 Elsevier B.V. All rights reserved.